<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">vestift</journal-id><journal-title-group><journal-title xml:lang="ru">Известия Национальной академии наук Беларуси. Серия физико-технических наук</journal-title><trans-title-group xml:lang="en"><trans-title>Proceedings of the National Academy of Sciences of Belarus. Physical-technical series</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1561-8358</issn><issn pub-type="epub">2524-244X</issn><publisher><publisher-name>The Republican Unitary Enterprise Publishing House "Belaruskaya Navuka"</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">vestift-318</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>МАТЕРИАЛОВЕДЕНИЕ, МЕТАЛЛУРГИЯ</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>MATERIALS SCIENCES AND ENGINEERING, METALLURGY</subject></subj-group></article-categories><title-group><article-title>ЭЛЕКТРОХИМИЧЕСКИ ОСАЖДЕННЫЕ ПОКРЫТИЯ НА ОСНОВЕ ВИСМУТА И ЭФФЕКТИВНОСТЬ ИХ ЗАЩИТЫ ОТ ЭЛЕКТРОННОГО ИЗЛУЧЕНИЯ</article-title><trans-title-group xml:lang="en"><trans-title>ELECTROCHEMICAL DEPOSED BISMUTH COATINGS AND THE EFFICIENCY OF THEIR PROTECTION FROM ELECTRON IRRADIATION</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Тишкевич</surname><given-names>Д. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Tishkevich</surname><given-names>D. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>младший научный сотрудник лаборатории физики магнитных пленок</p></bio><bio xml:lang="en"><p>Junior Researcher at Physics of Magnetic Films Laboratory</p></bio><email xlink:type="simple">dashachushkova@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Богатырев</surname><given-names>Ю. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Bogatyrev</surname><given-names>Y. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>доктор технических наук, главный научный сотрудник лаборатории радиационных воздействий</p></bio><bio xml:lang="en"><p>D. Sc. (Engineering), Сhief Researcher at Radiation Effects Laboratory</p></bio><email xlink:type="simple">bogat@physics.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Грабчиков</surname><given-names>С. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Grabchikov</surname><given-names>S. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>доктор физико- математических наук, главный научный сотрудник лаборатории физики магнитных пленок</p></bio><bio xml:lang="en"><p>D. Sc. (Physics and Mathematics), Сhief Researcher at Physics of Magnetic Films Laboratory</p></bio><email xlink:type="simple">gss@ifttp.bas-net.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ластовский</surname><given-names>С. Б.</given-names></name><name name-style="western" xml:lang="en"><surname>Lastovskii</surname><given-names>S. B.</given-names></name></name-alternatives><bio xml:lang="ru"><p>кандидат физико-математических наук, заведующий лабораторией радиационных воздействий</p></bio><bio xml:lang="en"><p>Ph. D. (Physics and Mathematics), Heard at Radiation Effects Laboratory</p></bio><email xlink:type="simple">lastov@ifttp.bas-net.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Цыбульская</surname><given-names>Л. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Tsybulskaya</surname><given-names>L. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>кандидат химических наук, ведущий научный сотрудник лаборатории химии тонких пленок</p></bio><bio xml:lang="en"><p>Ph. D. (Chemistry), Leading Researcher at Thin Films Chemistry Laboratory</p></bio><email xlink:type="simple">tsybul@bsu.by</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Шендюков</surname><given-names>В. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Shendyukov</surname><given-names>V. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>младший научный сотрудник лаборатории химии тонких пленок</p></bio><bio xml:lang="en"><p>Junior Researcher at Thin Films Chemistry Laboratory</p></bio><email xlink:type="simple">shendi@mail.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Перевозников</surname><given-names>С. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Perevoznikov</surname><given-names>S. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>научный сотрудник лаборатории химии тонких пленок</p></bio><bio xml:lang="en"><p>Researcher at Thin Films Chemistry Laboratory</p></bio><email xlink:type="simple">perevoznikov@bsu.by</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Позняк</surname><given-names>С. К.</given-names></name><name name-style="western" xml:lang="en"><surname>Poznyak</surname><given-names>S. K.</given-names></name></name-alternatives><bio xml:lang="ru"><p>кандидат химических наук, ведущий научный сотрудник лаборатории химии тонких пленок</p></bio><bio xml:lang="en"><p>Ph. D. (Chemistry), Leading Researcher at Thin Films Chemistry laboratory</p></bio><email xlink:type="simple">poznyak@bsu.by</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Труханов</surname><given-names>А. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Trukhanov</surname><given-names>A. V.</given-names></name></name-alternatives><bio xml:lang="ru"><p>кандидат физико- математических наук, ведущий научный сотрудник лаборатории физики магнитных пленок</p></bio><bio xml:lang="en"><p>Ph. D. (Physics and Mathematics), Leading Researcher at Physics of Magnetic Films laboratory</p></bio><email xlink:type="simple">truhanov86@mail.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Научно-практический центр Национальной академии наук Беларуси по материаловедению</institution></aff><aff xml:lang="en"><institution>Scientific-Practical Materials Research Center of the National Academy of Sciences of Belarus</institution></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Научно-исследовательский институт физико-химических проблем&#13;
Белорусского государственного университета</institution></aff><aff xml:lang="en"><institution>Research Institute for Physical Chemical Problems of the Belarusian State University</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2017</year></pub-date><pub-date pub-type="epub"><day>09</day><month>10</month><year>2017</year></pub-date><volume>0</volume><issue>3</issue><fpage>19</fpage><lpage>29</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Тишкевич Д.И., Богатырев Ю.В., Грабчиков С.С., Ластовский С.Б., Цыбульская Л.С., Шендюков В.С., Перевозников С.С., Позняк С.К., Труханов А.В., 2017</copyright-statement><copyright-year>2017</copyright-year><copyright-holder xml:lang="ru">Тишкевич Д.И., Богатырев Ю.В., Грабчиков С.С., Ластовский С.Б., Цыбульская Л.С., Шендюков В.С., Перевозников С.С., Позняк С.К., Труханов А.В.</copyright-holder><copyright-holder xml:lang="en">Tishkevich D.I., Bogatyrev Y.V., Grabchikov S.S., Lastovskii S.B., Tsybulskaya L.S., Shendyukov V.S., Perevoznikov S.S., Poznyak S.K., Trukhanov A.V.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://vestift.belnauka.by/jour/article/view/318">https://vestift.belnauka.by/jour/article/view/318</self-uri><abstract><p>Современные изделия микроэлектронной техники широко применяются в ракетно-космической, авиационной, военной и атомной технике. Однако данные изделия весьма чувствительны к воздействию различных ионизирующих излучений (электроны, протоны, тяжелые заряженные частицы, рентгеновское и гамма-излучения). В настоящее время спектр синтезируемых материалов достаточно широк, ряд из них может быть перспективен для использования в качестве экранов радиационной защиты. В качестве материала экранов, эффективно поглощающих высокоэнергетические излучения, обычно используют тяжелые элементы. Наиболее широко применяемый тяжелый металл – свинец, но он имеет ряд недостатков. Висмут является нетоксичным и обладает невысокой стоимостью, а широкие технологические возможности получения делают его весьма актуальным для применения в качестве материала для радиационной защиты. Исследованы условия электрохимического осаждения и структура покрытий висмута, а также влияние на них различных органических добавок. Показано, что покрытия на основе висмута имеют ромбоэдрический тип кристаллической решетки, а введение в электролит ряда органических добавок приводит к изменению текстуры роста покрытий. Установлено, что с ростом толщины покрытий микроструктура изменяется от дендридной, крупнокристаллической, – к мелкодисперсной. Изучена эффективность радиационной защиты экранов на основе висмута при облучении электронами с энергией 1,6–1,8 МэВ. Эффективность ослабления электронного потока оценивалась по изменению вольтамперных характеристик тестовых МОП-транзисторных структур, расположенных за экранами и без экранов. Установлено, что оптимальными с точки зрения эффективности защиты и массогабаритных параметров являются экраны из висмута характеризующиеся значениями приведенной толщины 2 г/см2 и коэффициентом ослабления, равным 156.</p><p> </p></abstract><trans-abstract xml:lang="en"><p>Microelectronic products are widely used in aerospace, aviation, military and nuclear engineering. However, they are very sensitive to various ionizing radiations (electrons, protons, heavy charged particles, X-ray and gamma radiation). The common used material for radiation protection is lead. In recent years, bismuth deposition has become an interesting subject for the electrochemical community because of bismuth’s unique electrical, physical and chemical properties. There is a limited number of authors dealing with continuous bismuth films onto metallic substrates by electrodeposition. The conditions of electrochemical deposition of bismuth and the structure of coatings were examined. Electrochemical deposition with the inputted various organic additives and without them was carried out. It is shown that bismuth coatings have a rhombohedral lattice, and thаt adding of a number of organic additives into the electrolyte results changing in a coatings growth texture. The protection efficiency of shields based on bismuth under 1.6–1.8 MeV electron irradiation energy was measured. The electron beam attenuation efficiency was estimated by changing of current-voltage characteristics of semiconductor test structures which were located behind the shields and without them. It has been determined that bismuth shields with 2 g/cm2 reduced thickness and attenuation coefficient of 156 have optimal protection effectiveness and mass dimensional parameters.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>электрохимическое осаждение</kwd><kwd>экранирование</kwd><kwd>радиационная защита</kwd><kwd>висмут</kwd><kwd>облучение электронами</kwd></kwd-group><kwd-group xml:lang="en"><kwd>electrochemical deposition</kwd><kwd>shielding</kwd><kwd>radiation protection</kwd><kwd>bismuth</kwd><kwd>electron irradiation</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Effectiveness of IC shielded packages against space radiation / J. P. Spratt [et al.] // IEEE Transactions on Nuclear Science. – 1997. – Vol. 44, iss. 6. – P. 2018–2025.</mixed-citation><mixed-citation xml:lang="en">Spratt J. P., Passenheim B.C., Leadon R. E., Clark S., Strobel D. J. Effectiveness of IC shielded packages against space radiation. IEEE Transactions on Nuclear Science, 1997, vol. 44, iss. 6, pp. 2018–2025. Doi: 10.1109/23.658984</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Ефремов, Г. А. Новые материалы для локальной радиационной защиты / Г. А. Ефремов // Физика и химия обработки материалов. – 2003. – № 1. – С. 33–37.</mixed-citation><mixed-citation xml:lang="en">Efremov G. A. The new materials for the local radiation protection. Fizika i khimiia obrabotki materialov = Physics and Chemistry of Materials Treatment, 2003, no. 1, pp. 33–37 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">RAD-COAT protection [Electronic resource] / Spase Electronics. – Mode of access: www.spacelectronics.com. – Date of access: 20.03.2017.</mixed-citation><mixed-citation xml:lang="en">RAD-COAT protection. Available at: http://www.spacelectronics.com (accessed 20.03.2017).</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">RAD-PAK protection [Electronic resource] / Maxwell Technologies, INC. – Mode of access: www.maxwell.com/ proucts/microelectronics. – Date of access: 20.03.2017.</mixed-citation><mixed-citation xml:lang="en">RAD-PAK protection. Available at: http:// www.maxwell.com/products/microelectronics (accessed 20.03.2017).</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Борц, Б. В. Моделирование прохождения электронов через слоистый композиционный материал / Б. В. Борц, И. Г. Марченко, П. Н. Бездверный // Вопр. атом. науки и техники. Сер. Физика радиационных повреждений и радиационное материаловедение. – 2009. – № 4. – С. 175–177.</mixed-citation><mixed-citation xml:lang="en">Borc B. V., Marchenko I. G., Bezverniy P. N. Simulation of electron transport through the stratified composit material. Voprosy atomnoi nauki i tekhniki. Seriia: Fizika radiatsionnykh povrezhdenii i radiatsionnoe materialovedenie = Problems of Atomic Science and Technology. Series: Physics of Radiation Effects and Radiation Materials Science, 2009, no. 94, pp. 175–177 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">Першенков, В. С. Поверхностные радиационные эффекты в элементах интегральных микросхем / В. С. Першенков, В. Д. Попов, А. В. Шальнов. – М.: Энергоатомиздат, 1988. – 256 с.</mixed-citation><mixed-citation xml:lang="en">Pershenkov V. S. Surface radiation effects in the integrated microcircuits elements. Moscow, Energoatomizdat Publ., 1988. 256 p. (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">Nikiforov, A. Y. Simulation of Space Radiation Effects in Microelectronic Parts / A. Y. Nikiforov, A. I. Chumakov // Effects of Space Weather on Technology Infrastructure. NATO Science Series II: Mathematics, Physics and Chemistry. Dordrecht: Springer, 2004. – Vol. 176. – P. 165–184.</mixed-citation><mixed-citation xml:lang="en">Nikiforov A.Y., Chumakov A. I. Simulation of Space Radiation Effects in Microelectronic Parts. Daglis I. A. (ed.). Effects of Space Weather on Technology Infrastructure. NATO Science Series II: Mathematics, Physics and Chemistry. Vol. 176. Springer, Dordrecht, 2004, pp. 165–184. Doi: 10.1007/1-4020-2754-0_9</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">Gamma radiation shielding and optical properties measurement of zinc bismuth borate glasses / P. Yasaka [et al.] // Annals of Nuclear Energy. – 2014. – Vol. 68. – P. 4–9.</mixed-citation><mixed-citation xml:lang="en">Yasaka P., Pattanaboonmee N., Kim H. J., Limkitjaroenporn P., Kaewkhao J. Gamma radiation shielding and optical properties measurement of zinc bismuth borate glasses. Annals of Nuclear Energy, 2014, vol. 68, pp. 4–9. Doi: 10.1016/j. anucene.2013.12.015</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">Bismuth oxide-coated fabrics for X-ray shielding / Huda Ahmed Maghrabi [et al.] // Textile Res. J. – 2015. – Vol. 86, iss. 6. – P. 649–658.</mixed-citation><mixed-citation xml:lang="en">Huda Ahmed Maghrabi, Arun Vijayan, Pradip Deb, Lijing Wang. Bismuth oxide-coated fabrics for X-ray shielding. Textile Research Journal, 2015, vol. 86, iss. 6, pp. 649–658. Doi: 10.1177/0040517515592809</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">Radiation attenuation by lead and nonlead materials used in radiation shielding garments / J. P. McCaffrey [et al.] // Med. Phys. – 2007. – Vol. 34, N 2. – P. 530–537.</mixed-citation><mixed-citation xml:lang="en">McCaffrey J. P., Shen H., Downton B., Mainegra-Hing E. Radiation attenuation by lead and nonlead materials used in radiation shielding garments. Medical Physics, 2007, vol. 34, no. 2, pp. 530–537. Doi: 10.1118/1.2426404</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">Shielding properties of lead-free protective clothing and their impact on radiation doses / H. Schlattl [et. al.] // Med. Phys. – 2007. – Vol. 34, N 11. – P. 4270–4280.</mixed-citation><mixed-citation xml:lang="en">Schlattl H., Zankl M., Eder H., Hoeschen C. Shielding properties of lead-free protective clothing and their impact on radiation doses. Medical Physics, 2007, vol. 34, no. 11, pp. 4270–4280. Doi: 10.1118/1.2786861</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">McCaffrey, J. P. Optimizing non-Pb radiation shielding materials using bilayers / J. P. McCaffrey, E. Mainegra-Hing, H. Shen // Med. Phys. – 2009. – Vol. 36, N 12. – P. 5586–5594.</mixed-citation><mixed-citation xml:lang="en">McCaffrey J. P., Mainegra-Hing E., Shen H. Optimizing non-Pb radiation shielding materials using bilayers. Medical Physics, 2009, vol. 36, no. 12, pp. 5586–5594. Doi: 10.1118/1.3260839</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">Гальванотехника : справочник / под ред. А. М. Гинберга [и др.]. – М.: Металлургия, 1987. – 736 с.</mixed-citation><mixed-citation xml:lang="en">Ginberg A. M. Galvanotechnics. Moscow, Metallyrgiya Publ., 1987. 736 p. (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">Особенности оценки радиационной стойкости микросхем в специализированных защитных корпусах / А. В. Уланова [и др.] // Проблемы разработки перспективных микро- и наноэлектронных систем (МЭС-2012) : сб. тр. / под общ. ред. А. Л. Стемпковского. – М.: ИППМ РАН, 2012. – C. 584–587.</mixed-citation><mixed-citation xml:lang="en">Ulanova A. V., Sogoian A. V., Chumakov A. I., Nikiforov A. Iu., Petrov A. G. Features of the evaluation of the radiation resistance of microcircuits in specialized protective enclosures. Problemi razrabotki perspektivnih micro-i nanoelectronnih system (MES-2012) [Problems of development of perspective micro- and nanoelectronic systems (MES-2012)]. Moskow, Institute for Design Problems in Microelectronics of Russian Academy of Sciences, 2012, pp. 584– 587 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">Математическое моделирование свойств неоднородных структур для систем радиационной защиты / Н. П. Чирская [и др.] // Тр. 21-й Междунар. конф. «Радиационная физика твердого тела». – Севастополь, 2011. – С. 436–443.</mixed-citation><mixed-citation xml:lang="en">Chirskaya N. P., Voronin E. N., Mileev V. N., Novikov L. S., Sinolic V. V. Mathematical modeling of heterogeneous structures properties for radiation protection systems. Trudy 21 Mezdunarodnoy ronferencii “Radiacionnaya fizika tverdogo tela” [Proceedings of 21st International Conference “Radiation Solid State Physics”], Sevastopol’, 2011, pp. 436–443 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit16"><label>16</label><citation-alternatives><mixed-citation xml:lang="ru">Дозиметрический контроль на борту космических аппаратов с помощью МДП-дозиметров / О. В. Мещуров [и др.] // Вопр. атом. науки и техники. Сер. Физика радиационного воздействия на радиоэлектронную аппаратуру. – 2002. – Вып. 4. – С. 34–38.</mixed-citation><mixed-citation xml:lang="en">Meshurov O. V., Tapero K. I., Emel’yanov V. V., Ulimov V. N. The onboard dosimetric control of space apparatus by using MOS-dosimeters. Voprosy atomnoi nauki i tekhniki. Seriia: Fizika radiatsionnogo vozdeistviia na radioelektronnuiu apparaturu = Problems of Atomic Science and Technology. Series: Physics of radiation effects on radio-electronic equipment, 2002, iss. 4, pp. 34–38 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit17"><label>17</label><citation-alternatives><mixed-citation xml:lang="ru">August, L. S. Estimating and reducing errors in MOS dosimeters caused by exposure to different radiations / L. S. August // IEEE Trans. Nucl. Sci. – 1982. – Vol. 29, N 6. – P. 2000–2003.</mixed-citation><mixed-citation xml:lang="en">August L. S. Estimating and Reducing Errors in MOS Dosimeters Caused by Exposure to Different Radiations. IEEE Transactions on Nuclear Science, 1982, vol. 29, iss. 6, pp. 2000–2003. Doi: 10.1109/TNS.1982.4336486</mixed-citation></citation-alternatives></ref><ref id="cit18"><label>18</label><citation-alternatives><mixed-citation xml:lang="ru">Пономарев, В. Н. Измерение спектра быстрых электронов с использованием МОП транзисторов / В. Н. Пономарев, В. Д. Попов, Е. А. Яшков // Научная сессия МИФИ-2005 : сб. науч. тр. – М.: МИФИ, 2005. – Т. 1. – C. 87–88.</mixed-citation><mixed-citation xml:lang="en">Ponomarev V. N., Popov V. D., Yashkov E. A. The spectrum of fast electrons measurement by using MOS transistrors. Naychnaya sessiya MIFI: sbornik nauchnykh trudov. T. 1 [Scientific Session MEPhI-2005. Collection of scientific papers. Vol. 1]. Moscow, Moscow Engineering Physics Institute, 2005, pp. 87–88 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit19"><label>19</label><citation-alternatives><mixed-citation xml:lang="ru">Коршунов, Ф. П. Воздействие радиации на интегральные микросхемы / Ф. П. Коршунов, Ю. В. Богатырев, В. А. Вавилов. – Минск: Наука и техника, 1986. – 254 c.</mixed-citation><mixed-citation xml:lang="en">Korshunov F. P., Bogaturev U. V., Vavilov V. A. The radiation influence on integrated circuits. Minsk, Nauka i technika Publ., 1986. 254 p. (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit20"><label>20</label><citation-alternatives><mixed-citation xml:lang="ru">Electrodeposition of bismuth from nitric acid electrolyte / E. Sandnes [et. al.] // Electrochimica Acta. – 2007. – Vol. 52, N 21. – P. 6221–6228.</mixed-citation><mixed-citation xml:lang="en">Sandnes E., Williams M. E., Bertocci U., Vaudin M. D., Stafford G. R. Electrodeposition of bismuth from nitric acid electrolyte. Electrochimica Acta, 2007, no. 52, no. 21, pp. 6221–6228. Doi: 10.1016/j.electacta.2007.04.002</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
