FEATURES OF FORMING OF COPPER DEPOSIT IN PORES OF SILICON OXIDE
Abstract
Using the SiO2 porous templates on silicon substrate, Si/SiO2(Cu) nanostructures have been synthesized by electrochemical method. A comprehensive study by means of scanning electron, transmission electron, atomic force microscopy and diffraction analysis techniques have been conducted. The morphological features and the lateral dimensions of metal nanostructures, deposited in the pores, have been defined. A tendency to form copper agglomerates with dendritic shape have been shown. This structures are promising for using as catalyst or substrates for SERS.
About the Authors
E. Yu. KANIUKOVBelarus
E. K. BELONOGOV
Russian Federation
D. V. YAKIMCHUK
Belarus
A. L. KOZLOVSKIY
Kazakhstan
K. K. KADYRZHANOV
Kazakhstan
G. M. ARZUMANYAN
Russian Federation
S. E. DEMYANOV
Belarus
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