APPLICATION OF TEM FOR EVALUATION OF FORMATION OF ION BEAM MULTILAYER NANOSTRUCTURED COATINGS BASED ON CHROMIUM

The aim of the work is to study a mechanism of formation of a monolayer in a multilayered ion beam nanostructured coating by transmission electron microscopy (TEM), and a model of formation and growth of a monolayer by ion beam sputtering of target substrate with an ion assisting. To investigate the mechanism of formation and growth of monolayer in the coating a technique of sample preparation was developed for further study using electron microscopy Tescan MIRA (Czech Republic), allowing to obtain image surface of an object with high resolution, especially at low accelerating voltages. For the study of thin films, transmission electron microscopy is used much more frequently than scanning, so a console has been designed that allows to obtain images in the passing electrons – TE detector for study by scanning transmission electron microscopy (STEM – Scanning Transmission Electron Microscopy). During study of monolayers by transmission electron microscopy using a TE detector, a mechanism of the formation of monolayer in multilayer ion-beam nanostructured coating has been proposed, consisting of the following steps: the adsorption of chromium particles on the substrate surface; surface diffusion to the stage of a screw dislocation; 2D-growth of chromium monolayer (2D-formation terraces) of 2D-islands; 2D→3D transition – the transition to three-dimensional island growth mode (3D-growth) by the mechanism of Stransky – Krastanow. The model of formation and growth of monolayer under ion-beam sputtering of a target with ion-assisted substrate has been developed.

multilayer nanostructured coating, ion beam coating, mechanism of Stransky – Krastanow, a coherent island, scanning transmission electron microscopy method

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